発表論文・著書

発表論文

I . Fundamental Optics

    [1]
    Masato SHIBUYA and Kenji YAMADA;
    "Derivation of the Generalized Equation of Distortion by Integrating the Optical Differential Invariant"
    OPTIK Vol.113, No.1,pp.1-3. (2002)

    [2]
    Masato SHIBUYA, Kouichi AOYAGI, Suezou NAKADATE and Hiroki ONO;
    "Effect of fine undulation of lens surface on the optical Performance"
    SPIE Vol.4832-68 (2002) 563-570

    [3]
    Hiroyuki TAKATSUJI, Masato SHIBUYA, Suezou NAKADATE and Hiroki ONO;
    "The Afocal Sine Condition and the Stable Beam Shaping Optics"
    Extended Abstracts of the Optics Japan 2001, 6pc5 (2001) pp.171-172 (in Japanese)
    ：高辻浩之，渋谷眞人，中楯末三，小野広起　「アフォーカル正弦条件と安定的なビーム整形光学系」

    [4]
    S. Nakadate, T. Tokudome,M. Shiubuya;
    "Displacement measurement of a grating using moire modulation of an optical spectrum"
    Measurement Science and Technology, Vol.15 (2004) 1462-1466

    [5]
    Masato SHIBUYA, Akira NISHIKATA, Akira TAKADA, and Suzou NAKADATE:
    "Proposing the inclination factor which satisfies the reciprocity theorem in scalar imaging theory and confirming the validity by numerical calculations"
    SPIE Annual Meeting , SPIE Vol.6288 (2006) 6288-13

    [6]
    Masanori TANIKAWA, Masato SHIBUYA, Chie FUJIKAWA, Kazuhisa MAEHARA, Nobuaki WATANABE, Masayuki YAMAMOTO and Suezou NAKADATE;
    "Effectiveness of odd order aspherical surface,"
    Kogaku(Japanese Journal of Optics) Vol.36, No.11 (2007) (in Japanese)
    ：谷川剛基，渋谷眞人，藤川千恵，前原和寿，渡辺暢章，山本雅之，中楯末三 「奇数次非球面の有効性」 光学36巻11号 (2007)

    [7]
    渋谷眞人：「レンズの自動修正と局所最適化での不思議」サイバネットニュース、No.131夏号 http://www.cybernet.co.jp/products/magazine/cybernet_news/archive/131/no131_14-16.html

    [8]
    Akira TAKADA, Masato SHIBUYA, Takahiro SAITOH, Akira NISHIKATA, Kazuhisa MAEHARA and Suezou NAKADATE;
    "The Incoming Inclination Factor for Scalar Imaging Theory. "
    Optical Engineering Vol.49 No.2 023202 (2010)

    [9]
    Masato SHIBUYA, Kazuhisa MAEHARA, Yoshihito ISHIKAWA, Akira TAKADA, Kei KOBAYASHI, Mitsunori TOYODA, Masanori TANIKAWA, Suezou NAKADATE;
    "Theoretical investigation of the meaning of odd-order aspherical surface and numerical confirmation of effectiveness in the rotational-symmetric but off-axis optics "
    Optical Engineering Vol.49 (2010) to be published

    [10]
    Mikio OKA, Masato SHIBUYA, Kazuhisa MAEHARA, Shunsuke HASE and Suezou NAKADATE;
    "Optical Designing for Heaad Mount Display Giving Natural 3D Image"
    Kogaku(Japanese Journal of Optics) Vol.40 No.2 36-45 (2011)(in Japanese)
    ：岡幹生，渋谷眞人，前原和寿，長谷隼佑，中楯末三　「自然な立体視を与えるための光学系の設計」 光学40巻2号 (2011)

    [11]
    Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Mikio OKA and Suezo NAKADATE;
    "Optical Design Methods to Suppress Variation of Aberrations Which Caused by Change of Objict Distance"
    Kogaku(Japanese Journal of Optics) Vol.40 No.9 499-508 (2011)(in Japanese)
    ：長谷隼佑，渋谷眞人，前原和寿，岡幹生，中楯末三　「物体移動による収差変化を抑制する光学設計」 光学40巻9号 (2011)

    [12]
    Masato SHIBUYA;
    "Discussing the importance of pupil coordinate from the view point of the sine-condition in the presence of spherical aberration"
    SPIE Vol.8167A 816706-1-15 (2011)

    [13]
    Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Mikio OKA and Suezou NAKADATE
    "Optical design methods to suppress aberrations which are caused by change of object distance"
    SPIE Vol.8167A 81670Y-1-13 (2011)

    [14]
    Jo YAMAGUCHI, Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Tota MIZUNO and Suezou NAKADATE;
    "A Novel Design of Projection Optics for Dome Display"
    Kogaku(Japanese Journal of Optics) Vol.42 No.1 38-47 (2013)(in Japanese))
    ：山口城，長谷隼佑，渋谷眞人，前原和寿，水野統太，中楯末三　「ドーム型ディスプレー用投影光学系の設計」 光学42巻1号 (2013)

    [15]
    渋谷眞人;
    "【平成24年度日本光学会奨励賞受賞者紹介】長谷隼佑氏の紹介"
    光学42巻1号48頁(2013)

    [16]
    渋谷眞人;
    "「光学設計の基本法則を浸透・・・豊饒なる照明系開発のために」"
    ５２回光設計グループ機関紙,1-2（2013年、7月）

    [17]
    Masato SHIBUYA;
    "Lens Optics Brilliant Forver" Opt.Rev.Vol.21 No,6 (2014) 839-848

    [18]
    Takao Tanabe, Masato Shibuya, Kazuhisa Maehara
    “Convergence and Differentiation of Zernike Expansion: Application for an Analysis of Odd-Order Surfaces”： Optical Engineering, Vol.55,
    No.3 035101(2016)
    " http://caps.luminad.com:8080/stockage/stock/LDL-SPIE-OE-151711/OE-151711_online.pdf"　

    [19]
    Masato Shibuya, Akira Takada, and Toshiharu Nakashima,
    “Theoretical Study for Aerial Image Intensity in Resist in High NA Projection Optics and Experimental Verification with One-dimensional Patterns”, JM3, Vol.15, No.2 021206 (Apr-Jun 2016)
    " http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2501686"　

    [20]
    Takao Tanabe; Masato Shibuya ：”Aberration properties of odd-order surfaces in optical design” ,
    Opt. Eng. 55 (12), 125107 (December 28, 2016);
    " http://opticalengineering.spiedigitallibrary.org/article.aspx?articleid=2595589"　

II. Optical Lithography

    [1]
    Masato SHIBUYA and Hiromi EZAKI;
    "Improvement of two-photon absorption lithography"
    SPIE-4691, Microlithography Conference,March, 2002

    [2]
    Masato SHIBUYA;
    "Optical Lithography"
    Kogaku(Japanese Journal of Optics) Vol.31, No.4(2002) 274-276 (in Japanese)
    ：渋谷眞人　「光リソグラフィー」　光学　13巻，4号

    [3]
    Masato SHIBUYA;
    "Resolution enhancement technologies in optical lithography and challenges to breakthrough"
    Oyo Butsuri (A monthly publication of The Japan Society of Applied Physics) Vol.71 No.6 (2002) 695-699 (in Japanese)
    ：渋谷眞人　「光リソグラフィーにおける超解像技術とブレークスルーをめざして」　応用物理，71巻，６号

    [4]
    Masato SHIBUYA;
    "Integration of Many Fields of Optics for Extream Ultraviolet Lithography Development"
    Kogaku(Japanese Journal of Optics) Vol.41, No.7 (2002) p.523 (in Japanese)
    ：渋谷眞人　「極紫外リソグラフィー開発と光学の総合力」　光学31巻，7号

    [5]
    Hiromi EZAKI and Masato SHIBUYA;
    "Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist"
    SPIE Vol.5040-129 (2003) to be published.

    [6]
    Masato SHIBUYA, Hiromi EZAKI, Toshihumi FUKUI, Nobuaki WATANABE and Akira NISHIKATA;
    "Random aberration and local flare"
    SPIE Vol.5377 (Feb, 2004) 1910-1920

    [7]
    Hiromi EZAKI and Masato SHIBUYA;
    "Super-resolution by polarization-dependent two-photon absorption in optical lithography"
    Nonlinear Optics,Quantum Optics, Vol.32 No.4 (2004) 211-220

    [8]
    Masato SHIBUYA, Nobuaki WATANABE, Hiromi EZAKI and Suezou NAKADATE;
    "Considering the flare by introducing the random aberration and non-conserved aberration"
    SPIE Vol.5754 (2005) 1716-1727

    [9]
    Masato SHIBUYA, Hiroshi OOKI, Kimihiro SAITO, Suezou NAKADATE;
    "Generalizing Effective Point Spread Function and its application to the phase-contrast microscope"
    Optical Review Vol.12 (2005) 105-108

    [10]
    Tomohiro KUGE, Masato SHIBUYA and Suezou NAKADATE;
    "Pupil Imaging of Projection Lens for Semiconductor Exposure Equipment -Theory and Design-"
    Kougaku (Jpn.J.Opt) Vol.35,No.2(2005) 95-104 (in Japanese)
    ：公家大裕，渋谷眞人，中楯末三 「半導体露光装置用投影光学系の瞳結像」 光学35巻2号（2005）4

    [11]
    Masato SHIBUYA;
    "Effect of Fine Undulation of Wavefront Aberration"
    Kougaku (Jpn. J. Opt.) Vol.34,No.3 (2005) 124-131 (in Japanese)
    ：渋谷眞人「微細な波面収差の影響―半導体露光装置用投影レンズにおけるローカルフレアー」光学34巻３号

    [12]
    Masato SHIBUYA and Hiromi EZAKI;
    "Resolution Enhancement Technologies for Optical Lithography"
    ICO2005(2005,China)

    [13]
    Masato SHIBUYA, Nobuaki WATANABE, Masayuki YAMAMOTO, Toshihumi FUKUI, Hiromi EZAKI, Tomohiro KIIRE and Suezou NAKADATE;
    " Classification of Undulated Wavefront Aberration in Projection Optics by Considering Its Physical Effects"
    Opt.Eng. Vol.46,No.5(2007) 053001-1-6

    [14]
    A.Takada, T.Tojo and M.Shibuya;
    "A New Algorithm for Die-to-Wafer-like Image Mask Inspection in Real Time"
    Opt.Rev. Vol.14, No.6（2007）384-394

    [15]
    T.Takada, T.Tojo and M.Shibuya;
    "Coherence Control of illumination Optics in Mask Inspection Systems,"
    J. Micro/NanolithographyMEMS NOMEMS Vol.7 0430101-8 (2008)

    [16]
    T.Takada, T.Tojo and M.Shibuya;
    "Optimum Optics for Die-to-Wafer-like Image Mask Inspection"
    Opt.Rev. Vol.16, No.2 59-65(2009)

    [17]
    Jyunichi TAMAKI, Masato SHIBUYA, and Suezou NAKADATE;
    "Analytical Equation Predicting the Forbidden Pattern Pitch for Phase-Shifting Mask"
    SPIE Vol.8683 8683-81-1-9 (Feb,2013)

    [18]
    渋谷眞人;
    "「発明は極めて単純なきっかけから始まる」"
    応物　82巻6号、509-512（2013）

    [19]
    Junichi TAMAKI, Masato SHIBUYA and Suezou NAKADATE;
    " Analytical Equation Predicting the Forbidden Pattern Pitch for Phase-Shifting Mask"　
    Kogaku（Japanese Journal of Optic）Vol.42, No.12（2013）624―631
    田巻純一、渋谷眞人、中楯末三：" 「位相シフトマスクにおけるForbidden pitchを予測する解析的公式」"
    光学、42巻、12号、p.624-631　（2013,12月）

Ⅲ. 教育

    [1]
    渋谷眞人 : 「子供のための教育」応用物理教育、32巻1号(2008) 1-2

    [2]
    渋谷眞人 : 「教えるという事」ニューガラス、27巻106号(2008) 67-69
    http://www.newglass.jp/mag/TITL/maghtml/106-pdf/+106-p067.pdf

    [3]
    渋谷眞人:「日本語を磨く」（光技術コンタクト、2016年7月号)

著書

[1] ｢回折と結像の光学｣
(東京工芸大 渋谷眞人・ニコン 大木裕史著) 朝倉書店 光学ライブラリー２
ISBN: 4-254-13732-X C3342

光技術の基礎は回折と結像である。
理論の全体を体系的かつ実際的に解説し，最新の問題まで扱う。
回折の基礎／スカラー回折理論における結像／収差／ベクトル回折
／光学的超解像／付録（光波の記述法／輝度不変／ガウスビーム他）／他

[2] 「レンズ光学入門」
（東京工芸大学渋谷眞人著、2009年7月）　アドコムメディア㈱
ISBN: 978-4-915851-36-0
結像の本質を射抜く
ガウス光学／絞りと瞳／光線の自由度／収差／像の明るさと照明系の基礎
／波動光学の基礎／レンズの自動修正／赤外光学系

　

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