Tokyo Polytechnic University; Optical Designing Laboratory

 

  • Professor: Dr. Masato SHIBUYA
  • History
    Our university was founded as Konishiroku technical college of photo at 1923. In 1966, it was reorganized as Tokyo Photo University. From 1977, it was changed to Tokyo Institute of Polytechnics and also re-changed to Tokyo Polytechnic University from 2003.Optical Designing Laboratory is one of the hereditary laboratories in our university. From 2001, this laboratory has been managed by Professor Shibuya.
  • Current Research Activities

    I: Fundamental and theoretical development of optical designing methods and evaluation methods of optics.

II: Evaluation of Optical Lithography Optics by Theoretical Methodology and Computer Simulation. Development of Resolution Enhancement Technology.


III: Remote Sensing Optics: Designing and Evaluation by Computer Simulation.

  • Submitted Papers (from 2001)
    I . Fundamental Optics
  • [1]
    Masato SHIBUYA and Kenji YAMADA;
    "Derivation of the Generalized Equation of Distortion by Integrating the Optical Differential Invariant"
    OPTIK Vol.113, No.1,pp.1-3. (2002)

    [2]
    Masato SHIBUYA, Kouichi AOYAGI, Suezou NAKADATE and Hiroki ONO;
    "Effect of fine undulation of lens surface on the optical Performance"
    SPIE Vol.4832-68 (2002) 563-570

    [3]
    Hiroyuki TAKATSUJI, Masato SHIBUYA, Suezou NAKADATE and Hiroki ONO;
    "The Afocal Sine Condition and the Stable Beam Shaping Optics"
    Extended Abstracts of the Optics Japan 2001, 6pc5 (2001) pp.171-172 (in Japanese

    [4]
    S. Nakadate, T. Tokudome,M. Shiubuya;
    "Displacement measurement of a grating using moire modulation of an optical spectrum"
    Measurement Science and Technology, Vol.15 (2004) 1462-1466

    [5]
    Masato SHIBUYA, Akira NISHIKATA, Akira TAKADA, and Suzou NAKADATE:
    "Proposing the inclination factor which satisfies the reciprocity theorem in scalar imaging theory and confirming the validity by numerical calculations"
    SPIE Annual Meeting , SPIE Vol.6288 (2006) 6288-13

    [6]
    Masanori TANIKAWA, Masato SHIBUYA, Chie FUJIKAWA, Kazuhisa MAEHARA, Nobuaki WATANABE, Masayuki YAMAMOTO and Suezou NAKADATE;
    "Effectiveness of odd order aspherical surface,"
    Kogaku(Japanese Journal of Optics) Vol.36, No.11 (2007) (in Japanese)

    [7]
    Akira TAKADA, Masato SHIBUYA, Takahiro SAITOH, Akira NISHIKATA, Kazuhisa MAEHARA and Suezou NAKADATE;
    "The Incoming Inclination Factor for Scalar Imaging Theory. "
    Optical Engineering Vol.49 No.2 023202 (2010)

    [8]
    Masato SHIBUYA, Kazuhisa MAEHARA, Yoshihito ISHIKAWA, Akira TAKADA, Kei KOBAYASHI, Mitsunori TOYODA, Masanori TANIKAWA, Suezou NAKADATE;
    "Theoretical investigation of the meaning of odd-order aspherical surface and numerical confirmation of effectiveness in the rotational-symmetric but off-axis optics "
    Optical Engineering Vol.49 (2010) to be published

    [9]
    Mikio OKA, Masato SHIBUYA, Kazuhisa MAEHARA, Shunsuke HASE and Suezou NAKADATE;
    "Optical Designing for Heaad Mount Display Giving Natural 3D Image"
    Kogaku(Japanese Journal of Optics) Vol.40 No.2 36-45 (2011)(in Japanese)

    [10]
    Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Mikio OKA and Suezo NAKADATE;
    "Optical Design Methods to Suppress Variation of Aberrations Which Caused by Change of Objict Distance"
    Kogaku(Japanese Journal of Optics) Vol.40 No.9 499-508 (2011)(in Japanese)

    [11]
    Masato SHIBUYA;
    "Discussing the importance of pupil coordinate from the view point of the sine-condition in the presence of spherical aberration"
    SPIE Vol.8167A 816706-1-15 (2011)

    [12]
    Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Mikio OKA and Suezou NAKADATE
    "Optical design methods to suppress aberrations which are caused by change of object distance"
    SPIE Vol.8167A 81670Y-1-13 (2011)

    [13]
    Jo YAMAGUCHI, Shunsuke HASE, Masato SHIBUYA, Kazuhisa MAEHARA, Tota MIZUNO and Suezou NAKADATE;
    "A Novel Design of Projection Optics for Dome Display"
    Kogaku(Japanese Journal of Optics) Vol.42 No.1 38-47 (2013)(in Japanese)

    [14]
    Masato SHIBUYA;
    "Lens Optics Brilliant Forver" Opt.Rev.Vol.21 No,6 (2014) 839-848

    [15]
    Takao Tanabe, Masato Shibuya, Kazuhisa Maehara
    “Convergence and Differentiation of Zernike Expansion: Application for an Analysis of Odd-Order Surfaces”: Optical Engineering, Vol.55,
    No.3 035101(2016)
    " http://caps.luminad.com:8080/stockage/stock/LDL-SPIE-OE-151711/OE-151711_online.pdf" 

    [16]
    Masato Shibuya, Akira Takada, and Toshiharu Nakashima,
    “Theoretical Study for Aerial Image Intensity in Resist in High NA Projection Optics and Experimental Verification with One-dimensional Patterns”, JM3, Vol.15, No.2 021206 (Apr-Jun 2016)
    " http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2501686" 

    [17]
    Takao Tanabe; Masato Shibuya :”Aberration properties of odd-order surfaces in optical design” ,
    Opt. Eng. 55 (12), 125107 (December 28, 2016);
    " http://opticalengineering.spiedigitallibrary.org/article.aspx?articleid=2595589" 

II. Optical Lithography

[1]
Masato SHIBUYA and Hiromi EZAKI;
"Improvement of two-photon absorption lithography"
SPIE-4691, Microlithography Conference,March, 2002

[2]
Masato SHIBUYA;
"Optical Lithography"
Kogaku(Japanese Journal of Optics) Vol.31, No.4(2002) 274-276 (in Japanese)

[3]
Masato SHIBUYA;
"Resolution enhancement technologies in optical lithography and challenges to breakthrough"
Oyo Butsuri (A monthly publication of The Japan Society of Applied Physics) Vol.71 No.6 (2002) 695-699 (in Japanese)

[4]
Masato SHIBUYA;
"Integration of Many Fields of Optics for Extream Ultraviolet Lithography Development"
Kogaku(Japanese Journal of Optics) Vol.41, No.7 (2002) p.523 (in Japanese)

[5]
Hiromi EZAKI and Masato SHIBUYA;
"Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist"
SPIE Vol.5040-129 (2003) to be published.

[6]
Masato SHIBUYA, Hiromi EZAKI, Toshihumi FUKUI, Nobuaki WATANABE and Akira NISHIKATA;
"Random aberration and local flare"
SPIE Vol.5377 (Feb, 2004) 1910-1920

[7]
Hiromi EZAKI and Masato SHIBUYA;
"Super-resolution by polarization-dependent two-photon absorption in optical lithography"
Nonlinear Optics,Quantum Optics, Vol.32 No.4 (2004) 211-220

[8]
Masato SHIBUYA, Nobuaki WATANABE, Hiromi EZAKI and Suezou NAKADATE;
"Considering the flare by introducing the random aberration and non-conserved aberration"
SPIE Vol.5754 (2005) 1716-1727

[9]
Masato SHIBUYA, Hiroshi OOKI, Kimihiro SAITO, Suezou NAKADATE;
"Generalizing Effective Point Spread Function and its application to the phase-contrast microscope"
Optical Review Vol.12 (2005) 105-108

[10]
Tomohiro KUGE, Masato SHIBUYA and Suezou NAKADATE;
"Pupil Imaging of Projection Lens for Semiconductor Exposure Equipment -Theory and Design-"
Kougaku (Jpn.J.Opt) Vol.35,No.2(2005) 95-104 (in Japanese)

[11]
Masato SHIBUYA;
"Effect of Fine Undulation of Wavefront Aberration"
Kougaku (Jpn. J. Opt.) Vol.34,No.3 (2005) 124-131 (in Japanese)

[12]
Masato SHIBUYA and Hiromi EZAKI;
"Resolution Enhancement Technologies for Optical Lithography"
ICO2005(2005,China)

[13]
Masato SHIBUYA, Nobuaki WATANABE, Masayuki YAMAMOTO, Toshihumi FUKUI, Hiromi EZAKI, Tomohiro KIIRE and Suezou NAKADATE;
" Classification of Undulated Wavefront Aberration in Projection Optics by Considering Its Physical Effects"
Opt.Eng. Vol.46,No.5(2007) 053001-1-6

[14]
A.Takada, T.Tojo and M.Shibuya;
"A New Algorithm for Die-to-Wafer-like Image Mask Inspection in Real Time"
Opt.Rev. Vol.14, No.6(2007)384-394

[15]
T.Takada, T.Tojo and M.Shibuya;
"Coherence Control of illumination Optics in Mask Inspection Systems,"
J. Micro/NanolithographyMEMS NOMEMS Vol.7 0430101-8 (2008)

[16]
T.Takada, T.Tojo and M.Shibuya;
"Optimum Optics for Die-to-Wafer-like Image Mask Inspection"
Opt.Rev. Vol.16, No.2 59-65(2009)

[17]
Jyunichi TAMAKI, Masato SHIBUYA, and Suezou NAKADATE;
"Analytical Equation Predicting the Forbidden Pattern Pitch for Phase-Shifting Mask"
SPIE Vol.8683 8683-81-1-9 (Feb,2013)

[18]
Junichi TAMAKI, Masato SHIBUYA and Suezou NAKADATE;
" Analytical Equation Predicting the Forbidden Pattern Pitch for Phase-Shifting Mask" 
Kougaku (Jpn. J. Opt.) Vol.42, No.12(2013)624―631(in Japanese)

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